Estudo das propriedades dos filmes de fosfato de cálcio produzidos pela técnica de sputtering
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The study of calcium phosphate coatings, in particular hydroxyapatite for applications on metal implants, has increased in order to improve the interaction between the tissue and the implant. In this work, calcium phosphate thin films were deposited by rf-sputtering and rf-magnetron sputtering techniques over Si and Ti substrates. For the films deposited by rf-sputtering the target was pressed at 2,5x103 kg and sintered at 600° C for 1 h. For the films deposited by rf-magnetron sputtering the target was pressed in the range of 1,5x103 kg to 3,5x103 kg and sintered in the range of RT (room temperature) to 750° C for 1 h. The chemical structure, composition and morphology of the coatings were evaluated using X-ray diffraction (XRD), infrared transmission (FTIR), scanning electron microscopy (SEM), energy dispersive spectrometry (EDS), thickness measurements and bioactivity evaluation over biologic fluid in vitro (SBF) procedures on the sample were made. The purpose of this work was evaluate the influence of the deposition parameters used in the sample prepared by rf-sputtering such as self bias voltage and substrate temperature on the structural properties and physicochemical characteristics of coatings. By the analysis of X-ray diffraction in samples prepared by rf-sputtering and rf-magnetron sputtering it was noted a significant crystallization of coatings resulting from the presence of (002) and (112) peaks and 30 nm grain size. Infra-red spectra results of the samples prepared by rf-sputtering and rf-magnetron sputtering showed one vibration frequency normally observed on hydroxyapatite samples at 1030 cm-1 and 520 cm-1. The presence of this very intense and defined bands indicated that the phosphate bands are well-ordered and similar to the hydroxyapatite s structure. EDS analysis showed that the ratio between the atomic concentration Ca/P of thin films prepared by rf-sputtering decreased with the increase of rf power. On the other hand, a ratio of 1,67 was obtained for coatings prepared by rf-magnetron sputtering. It was also observed that the maximum deposition rate occurred in samples prepared by rf-sputtering at 200°C. SEM analysis revealed the presence of hydroxyapatite grains uniformly distributed in the films prepared by both techniques. These results indicate that the films have potential for biomedical applications.